Conferences related to Interferometric lithography

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2020 IEEE International Instrumentation and Measurement Technology Conference (I2MTC)

The Conference focuses on all aspects of instrumentation and measurement science andtechnology research development and applications. The list of program topics includes but isnot limited to: Measurement Science & Education, Measurement Systems, Measurement DataAcquisition, Measurements of Physical Quantities, and Measurement Applications.


2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems & Eurosensors XXXIII (TRANSDUCERS & EUROSENSORS XXXIII)

The world's premiere conference in MEMS sensors, actuators and integrated micro and nano systems welcomes you to attend this four-day event showcasing major technological, scientific and commercial breakthroughs in mechanical, optical, chemical and biological devices and systems using micro and nanotechnology.The major areas of activity in the development of Transducers solicited and expected at this conference include but are not limited to: Bio, Medical, Chemical, and Micro Total Analysis Systems Fabrication and Packaging Mechanical and Physical Sensors Materials and Characterization Design, Simulation and Theory Actuators Optical MEMS RF MEMS Nanotechnology Energy and Power


2019 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC)

CLEO®/Europe will showcase the latest developments in a wide range of laser and photonics areas including laser source development, materials, ultrafast science, fibre optics, nonlinear optics, terahertz sources, high-field physics, optical telecommunications, nanophotonics, biophotonics.EQEC will feature the fundamentals of quantum optics, quantum information, atom optics, ultrafast optics, nonlinear phenomena and self-organization, plasmonics and metamaterials, fundamental nanooptics, theoretical and computational photonics.


2019 IEEE 19th International Conference on Nanotechnology (IEEE-NANO)

DNA Nanotechnology Micro-to-nano-scale Bridging Nanobiology and Nanomedicine Nanoelectronics Nanomanufacturing and Nanofabrication Nano Robotics and Automation Nanomaterials Nano-optics, Nano-optoelectronics and Nanophotonics Nanofluidics Nanomagnetics Nano/Molecular Heat Transfer & Energy Conversion Nanoscale Communication and Networks Nano/Molecular Sensors, Actuators and Systems


2019 IEEE Photonics Conference (IPC)

The IEEE Photonics Conference, previously known as the IEEE LEOS Annual Meeting, offers technical presentations by the world’s leading scientists and engineers in the areas of lasers, optoelectronics, optical fiber networks, and associated lightwave technologies and applications. It also features compelling plenary talks on the industry’s most important issues, weekend events aimed at students and young photonics professionals, and a manufacturer’s exhibition.


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Periodicals related to Interferometric lithography

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Electron Devices, IEEE Transactions on

Publishes original and significant contributions relating to the theory, design, performance and reliability of electron devices, including optoelectronics devices, nanoscale devices, solid-state devices, integrated electronic devices, energy sources, power devices, displays, sensors, electro-mechanical devices, quantum devices and electron tubes.


Lightwave Technology, Journal of

All aspects of optical guided-wave science, technology, and engineering in the areas of fiber and cable technologies; active and passive guided-wave componentry (light sources, detectors, repeaters, switches, fiber sensors, etc.); integrated optics and optoelectronics; systems and subsystems; new applications; and unique field trials.


Magnetics, IEEE Transactions on

Science and technology related to the basic physics and engineering of magnetism, magnetic materials, applied magnetics, magnetic devices, and magnetic data storage. The Transactions publishes scholarly articles of archival value as well as tutorial expositions and critical reviews of classical subjects and topics of current interest.


Microelectromechanical Systems, Journal of

A journal covering Microsensing, Microactuation, Micromechanics, Microdynamics, and Microelectromechanical Systems (MEMS). Contains articles on devices with dimensions that typically range from macrometers to millimeters, microfabrication techniques, microphenomena; microbearings, and microsystems; theoretical, computational, modeling and control results; new materials and designs; tribology; microtelemanipulation; and applications to biomedical engineering, optics, fluidics, etc. The Journal is jointly sponsored by the IEEE Electron Devices ...


Nanotechnology, IEEE Transactions on

The proposed IEEE Transactions on Nanotechnology will be devoted to the publication of manuscripts of archival value in the general area of nanotechnology, that is rapidly emerging as one of the fastest growing and most promising new technological developments for the next generation and beyond.


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Most published Xplore authors for Interferometric lithography

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Xplore Articles related to Interferometric lithography

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Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography

LEOS 2007 - IEEE Lasers and Electro-Optics Society Annual Meeting Conference Proceedings, 2007

Arrays of holes and pillars were fabricated by multiple exposure interferometric lithography using a table top lambda = 46.9 nm wavelength laser. Size and the feature characteristic is controlled changing the applied exposure dose.


Double diffraction alignment method using checker grating

1987 Symposium on VLSI Technology, 1987

An interferometric alignment method, using checker grating construction, has been newly demonstrated for submicron lithography. This alignment method has satisfied resist process and lithography system requirements and has the following characteristics.


Two-photon interferometer operating at 1550 nm for polarization entanglement

InternationalQuantum Electronics Conference, 2004. (IQEC)., 2004

Polarization-entangled photon pairs are generated at 1550 nm using a stabilized fiber-optic interferometer with two PPLN waveguides. The visibilities with and without accidental coincidences are ~0.77 and ~1, respectively


Design of a phase-shifting optical feedback interferometer using an electrooptic modulator

IEEE Journal of Selected Topics in Quantum Electronics, 2000

A laser sensor using optical feedback interferometry has been designed to measure displacements up to several micrometers. For this purpose, a lithium niobate crystal generates a phase shift in order to modulate at a frequency of 580 kHz the optical path difference between the sensor and the target. This setup has been calibrated by means of a commercial optical fiber ...


Multiple nanowire gate field effect transistors

Proceedings of the 2001 1st IEEE Conference on Nanotechnology. IEEE-NANO 2001 (Cat. No.01EX516), 2001

Novel metal oxide semiconductor field effect transistor (MOSFET) architectures aimed at sub 1 V operation with enhanced current driving capability are reported. In our design, the planar channel region in a conventional MOSFET is replaced by an array of isolated Si wires. Directional metal coverage of the two sidewalls and the top surface of each Si wire help achieve enhanced ...


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Educational Resources on Interferometric lithography

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IEEE-USA E-Books

  • Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography

    Arrays of holes and pillars were fabricated by multiple exposure interferometric lithography using a table top lambda = 46.9 nm wavelength laser. Size and the feature characteristic is controlled changing the applied exposure dose.

  • Double diffraction alignment method using checker grating

    An interferometric alignment method, using checker grating construction, has been newly demonstrated for submicron lithography. This alignment method has satisfied resist process and lithography system requirements and has the following characteristics.

  • Two-photon interferometer operating at 1550 nm for polarization entanglement

    Polarization-entangled photon pairs are generated at 1550 nm using a stabilized fiber-optic interferometer with two PPLN waveguides. The visibilities with and without accidental coincidences are ~0.77 and ~1, respectively

  • Design of a phase-shifting optical feedback interferometer using an electrooptic modulator

    A laser sensor using optical feedback interferometry has been designed to measure displacements up to several micrometers. For this purpose, a lithium niobate crystal generates a phase shift in order to modulate at a frequency of 580 kHz the optical path difference between the sensor and the target. This setup has been calibrated by means of a commercial optical fiber sensor. The overall accuracy resulting is better than 65 nm for a 1-kHz sinusoidal motion of the target at 10 cm away from the sensor.

  • Multiple nanowire gate field effect transistors

    Novel metal oxide semiconductor field effect transistor (MOSFET) architectures aimed at sub 1 V operation with enhanced current driving capability are reported. In our design, the planar channel region in a conventional MOSFET is replaced by an array of isolated Si wires. Directional metal coverage of the two sidewalls and the top surface of each Si wire help achieve enhanced gate control. Sub 1 V operation is achieved by reducing cross-sectional wire diameters to /spl sim/0.05 /spl mu/m. Since the conventional optical lithography techniques lack patterning resolution at this scale, a mix and match approach with interferometric lithography was employed. Super-resolution capability of interferometric lithography was applied to pattern nanoscale Si wires, while optical lithography was used to pattern non-critical device levels. Drain current versus gate voltage measurements of planar and wire MOSFETs demonstrated the superiority of the multiple nanowire gate design. Increasing the number of 0.05 /spl mu/m diameter wires significantly increased current flow in the channel region without sacrificing the low-voltage operation. The mix and match approach for patterning critical level nanoscale features represents a low-cost complement to optical lithography.

  • An air turbulence compensated interferometer: IC manufacturers' metrology needs translated into system component requirements

    Summary form only given. A new interferometric system has been developed, which is designed to meet the needs of high-end IC manufacturing in the immediate future. High-precision positional measurements during the lithographic exposures for IC manufacturing are critical to the ability to fabricate fine geometry circuits at high yield. The positional measurements are provided by high-performance interferometers, which are limited in performance principally by the turbulent air inside the lithographic exposure tool (a stepper). These turbulent-air-induced positional errors typically have a magnitude in the range of 10 to 100 nm. Our new system is a combination of the conventionally used HeNe-based interferometer system and a second colinear system based on second-harmonic interferometry (SHI).

  • 8-bit integrated optical SNS ADC

    Recently, a new technique has been described for extending the resolution of an integrated optical multi-interferometer analog-to-digital converter (ADC). These types of ADCs can directly digitise the signals from an antenna and play an important role in eliminating the need for intermediate frequency and baseband processing. With resolution greater than 12 bits, these types of architectures are useful for a variety of applications. The new technique is based on the incorporation of a symmetrical number system (SNS) encoding to provide high resolution (greater than 1-bit per interferometer) while also reducing the complexity of the optical hardware. In this paper we present recent developments on an 8-bit design using this approach.<<ETX>>

  • Intrinsic problem affecting contact hole resolution in hyper NA era

    None

  • Extreme ultraviolet interferometric lithography with a desk-top system

    We demonstrate an amplitude division interferometer that using illumination from a high brightness desk top extreme ultraviolet (EUV) laser creates large area arrays of lines, holes and dots with sub-100 nm feature size.

  • Ultra-sensitive biosensor based on SU-8 planar interferometer

    SU-8 resist was used as a core/cladding waveguide material to fabricate a Mach-Zehnder interferometer (MZI) for biochemical sensing. The refractive index and the UV lithography processes of the SU-8 resist were optimized to give a SU-8 MZI chip with single-mode and high-efficiency transmission. Optical measurements reveal that the SU-8 MZI chip can transmit the NIR laser (/spl lambda/=1310 nm) with a total loss less than 6 dB. The bio-probes (rabbit IgG) were then immobilized on the surface of the SU-8 waveguide. When one branch of the MZI is in contact with the analyte (sheep anti-IgG), the interfered intensity changes accordingly and then stabilizes when the soaking time extended. The MZI chip is very sensitive and a dilute anti-IgG solution with a concentration as low as 10/sup -15/ g/ml can be detected. The polymer MZI chip is fabricated by molding (or LIGA) process. The low-cost, label-free, real-time and high-sensitivity MZI chip benefit many applications related to biological, environmental and industrial detection.



Standards related to Interferometric lithography

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Jobs related to Interferometric lithography

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