Metrology

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This article is about the science of measurement. (Wikipedia.org)






Conferences related to Metrology

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2020 IEEE 70th Electronic Components and Technology Conference (ECTC)

ECTC is the premier international conference sponsored by the IEEE Components, Packaging and Manufacturing Society. ECTC paper comprise a wide spectrum of topics, including 3D packaging, electronic components, materials, assembly, interconnections, device and system packaging, optoelectronics, reliability, and simulation.


2020 IEEE International Conference on Image Processing (ICIP)

The International Conference on Image Processing (ICIP), sponsored by the IEEE SignalProcessing Society, is the premier forum for the presentation of technological advances andresearch results in the fields of theoretical, experimental, and applied image and videoprocessing. ICIP 2020, the 27th in the series that has been held annually since 1994, bringstogether leading engineers and scientists in image and video processing from around the world.


2020 IEEE International Conference on Systems, Man, and Cybernetics (SMC)

The 2020 IEEE International Conference on Systems, Man, and Cybernetics (SMC 2020) will be held in Metro Toronto Convention Centre (MTCC), Toronto, Ontario, Canada. SMC 2020 is the flagship conference of the IEEE Systems, Man, and Cybernetics Society. It provides an international forum for researchers and practitioners to report most recent innovations and developments, summarize state-of-the-art, and exchange ideas and advances in all aspects of systems science and engineering, human machine systems, and cybernetics. Advances in these fields have increasing importance in the creation of intelligent environments involving technologies interacting with humans to provide an enriching experience and thereby improve quality of life. Papers related to the conference theme are solicited, including theories, methodologies, and emerging applications. Contributions to theory and practice, including but not limited to the following technical areas, are invited.


2020 IEEE International Instrumentation and Measurement Technology Conference (I2MTC)

The Conference focuses on all aspects of instrumentation and measurement science andtechnology research development and applications. The list of program topics includes but isnot limited to: Measurement Science & Education, Measurement Systems, Measurement DataAcquisition, Measurements of Physical Quantities, and Measurement Applications.


2020 Optical Fiber Communications Conference and Exhibition (OFC)

The Optical Fiber Communication Conference and Exhibition (OFC) is the largest global conference and exhibition for optical communications and networking professionals. For over 40 years, OFC has drawn attendees from all corners of the globe to meet and greet, teach and learn, make connections and move business forward.OFC attracts the biggest names in the field, offers key networking and partnering opportunities, and provides insights and inspiration on the major trends and technology advances affecting the industry. From technical presentations to the latest market trends and predictions, OFC is a one-stop-shop.


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Periodicals related to Metrology

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Advanced Packaging, IEEE Transactions on

The IEEE Transactions on Advanced Packaging has its focus on the modeling, design, and analysis of advanced electronic, photonic, sensors, and MEMS packaging.


Aerospace and Electronic Systems Magazine, IEEE

The IEEE Aerospace and Electronic Systems Magazine publishes articles concerned with the various aspects of systems for space, air, ocean, or ground environments.


Antennas and Propagation, IEEE Transactions on

Experimental and theoretical advances in antennas including design and development, and in the propagation of electromagnetic waves including scattering, diffraction and interaction with continuous media; and applications pertinent to antennas and propagation, such as remote sensing, applied optics, and millimeter and submillimeter wave techniques.


Antennas and Wireless Propagation Letters, IEEE

IEEE Antennas and Wireless Propagation Letters (AWP Letters) will be devoted to the rapid electronic publication of short manuscripts in the technical areas of Antennas and Wireless Propagation.


Applied Superconductivity, IEEE Transactions on

Contains articles on the applications and other relevant technology. Electronic applications include analog and digital circuits employing thin films and active devices such as Josephson junctions. Power applications include magnet design as well asmotors, generators, and power transmission


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Xplore Articles related to Metrology

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Metrology and inspection challenges for manufacturing 3D stacked IC's

ASMC 2013 SEMI Advanced Semiconductor Manufacturing Conference, 2013

In this paper we discuss the numerous metrology and inspection challenges that need to be overcome to really have high volume manufacturing of 3D integrated chips. The key metrology and inspections issues are addressed module wise. We start with the TSV module then move on to the wafer bonding and thinning module. This is followed by the bumping module, de-bonding ...


Inline detection for FinFET gate poly footing using e-Tilt metrology

2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC), 2018

Advanced FinFET device architecture generates new profile control requirement in 1× node and beyond. The corner at the intersection between the Gate and Fin is critical geometry for device yield and reliability. The residue-free corner at Gate-Fin interface after Polysilicon gate etch is desirable yet also a known challenge to detect and control. Current detection methods for gate poly footing, ...


Uncertainty analysis in waveform metrology: From vertical measurement to horizontal quantities

2016 IEEE MTT-S International Wireless Symposium (IWS), 2016

This paper investigates the covariance-matrix-based uncertainty propagation of waveforms from time-domain vertical measurements to horizontal parameters. Following the Guide to the Expression of Uncertainty in Measurement (GUM), the uncertainty of timebase, corresponding to target amplitude, of a measured waveform is evaluated upon the vertical measurement uncertainties, where the waveform function is used to determine the Jacobian matrix. As a result, ...


Optical frequency metrology with optical lattice clocks and optical frequency combs

2012 Conference on Precision electromagnetic Measurements, 2012

Laser frequency stabilization and atom manipulation are important techniques for optical frequency metrology. We report on the development of an ytterbium (<sup>171</sup>Yb) and a strontium (<sup>87</sup>Sr) optical lattice clock at the National Metrology Institute of Japan (NMIJ). The result of absolute frequency measurement of the <sup>171</sup>Yb lattice clock is shown. We also report on narrow-linewidth fiber-based frequency combs that are ...


Siberian Research Institute of Metrology. Stages of 70-year-old way and today tasks

2014 12th International Conference on Actual Problems of Electronics Instrument Engineering (APEIE), 2014

The paper presents the main results of the research and development carried out in the Siberian Research Institute of Metrology for 70 years of its existence. There is represented the history of the Institute, as well as tasks that are met by members of the Institute nowadays.


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Educational Resources on Metrology

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IEEE-USA E-Books

  • Metrology and inspection challenges for manufacturing 3D stacked IC's

    In this paper we discuss the numerous metrology and inspection challenges that need to be overcome to really have high volume manufacturing of 3D integrated chips. The key metrology and inspections issues are addressed module wise. We start with the TSV module then move on to the wafer bonding and thinning module. This is followed by the bumping module, de-bonding module and finally we finish with the stacking module. Within each of the modules we show the possible solutions for metrology and inspection and also discuss limitations of the available metrology and inspection if it is warranted.

  • Inline detection for FinFET gate poly footing using e-Tilt metrology

    Advanced FinFET device architecture generates new profile control requirement in 1× node and beyond. The corner at the intersection between the Gate and Fin is critical geometry for device yield and reliability. The residue-free corner at Gate-Fin interface after Polysilicon gate etch is desirable yet also a known challenge to detect and control. Current detection methods for gate poly footing, also known as gate skirt, are destructive with long turnaround time, resulting in slow progress in process development and high-volume process control. To meet the gap, e-Tilt imaging technique along with corner rounding algorithm has been developed on CDSEM platform to visualize and quantify residue at fin-gate intersection (poly-footing). In this paper, we'll discuss the challenges, approaches, and results associated with the first-in-industry implementation of the inline poly-footing detection within a HVM Fab. Two sets of DOEs (Design of Experiment) were conducted to validate the sensitivity to Etch recipes and Etch Chambers. The accuracy and precision of the poly-footing measurement were qualified with correlation to commonly used hammer test results and eTest results. Future study includes precision and throughput improvement to meet the need of 1× node.

  • Uncertainty analysis in waveform metrology: From vertical measurement to horizontal quantities

    This paper investigates the covariance-matrix-based uncertainty propagation of waveforms from time-domain vertical measurements to horizontal parameters. Following the Guide to the Expression of Uncertainty in Measurement (GUM), the uncertainty of timebase, corresponding to target amplitude, of a measured waveform is evaluated upon the vertical measurement uncertainties, where the waveform function is used to determine the Jacobian matrix. As a result, the uncertainty of time-related parameters, such as the FWHM of impulse signal, of the waveform can be easily analyzed. To validate this work, Monte Carlo Method is implemented for comparison.

  • Optical frequency metrology with optical lattice clocks and optical frequency combs

    Laser frequency stabilization and atom manipulation are important techniques for optical frequency metrology. We report on the development of an ytterbium (<sup>171</sup>Yb) and a strontium (<sup>87</sup>Sr) optical lattice clock at the National Metrology Institute of Japan (NMIJ). The result of absolute frequency measurement of the <sup>171</sup>Yb lattice clock is shown. We also report on narrow-linewidth fiber-based frequency combs that are used not only to measure the absolute frequency of the optical lattice clocks but also to servo control the frequency of the lasers for cooling and trapping Yb and Sr atoms.

  • Siberian Research Institute of Metrology. Stages of 70-year-old way and today tasks

    The paper presents the main results of the research and development carried out in the Siberian Research Institute of Metrology for 70 years of its existence. There is represented the history of the Institute, as well as tasks that are met by members of the Institute nowadays.

  • Automatic metrology algorithm identification using Pattern Matching

    The number of measurement points and their types are increasing with the increasing challenges of the new technology nodes. The industry is challenged to enhance and automate the current Design Based Metrology (DBM) recipe generation flow. This paper describes a novel methodology based on Pattern Matching (PM) to automate the flow of assigning the metrology algorithm parameter to each measurement location. Each measurement location in the design space is examined against a pre-populated database of patterns to select the proper metrology algorithm. The proposed technique increases the speed and efficiency of assigning this parameter to each location, and hence increases the speed of CD-SEM recipe generation. This novel flow is expected to ensure consistency between process characterization, modeling, verification and product monitoring and control.

  • Low-cost power systems metrology laboratory based on raspberry Pi

    In this paper, a low-cost Power Systems Metrology Laboratory, based on the Raspberry Pi board and the ADE7878 energy metering IC is presented. The designed experimental platform is intended for developing skills among the undergraduate students of the University of Strathclyde, Glasgow, and the Autonomous University of Yucatan, Mexico. A series of exercises have been developed in order to measure different Power quantities and to evaluate different definitions of such quantities to observe how the accuracy of the measurements is affected, particularly, when non-sinusoidal conditions exist. The system is capable to perform measurements of single or three-phase, employing current transformers. A set of Simulink blocks is ready to use for the students, including PMU algorithms. The proposed laboratory facilitate the evaluation of new algorithms and functions, developed by the students.

  • Research on System-level Automatic Metrology System for Aircraft Integrated Automatic Test Equipment

    In order to solve the problems in metrology support for aircraft integrated automatic test equipment ( IATE ), the paper proposes a set of system-level automatic metrology project. First, the paper analyzes aircraft integrated automatic test equipment test demands and hardware/software construction, works out system level metrology rules, clarifies system-level metrology parameters, range and uncertainty. Second, it puts forward a set of methods for IATE system-level metrology, composing verification standards and calibration regulations. Third, through the development on dedicated metrology modules and test program set (TPS), it designs a system-level automatic metrology system for a certain aircraft IATE. The application shows the system-level automatic metrology system can realize metrology support for the aircraft IATE effectively, ensure the accuracy, consistency and credibility of the IATE parameters, shorten metrology support duration, lower technical level of metrology support personnel.

  • Time metrology in the Galileo navigation system: The experience of the Italian National Metrology Institute

    Timekeeping is crucial in Global Navigation Satellite Systems (GNSS), being the positioning accuracy directly related to a time measurement. As a consequence, the typical expertise of time metrology laboratories is necessary in many different aspects of a navigation system. This paper presents the experience of INRIM in the development of the Galileo navigation system from the earlier studies till the very recent In Orbit Validation phase showing how the time metrology practice has been useful in the understanding of time aspects of navigation and showing as well how the navigation service perspective has stimulated new ideas and better understanding of time measures.

  • Medical devices in legal metrology

    In addition to knowledge and experience of medical doctors, correct diagnosis and appropriate patient treatment largely depend on accuracy and functionality of medical devices. In a large number of serious medical situations proper functionality of medical devices is crucial for patients. Therefore it is necessary to carry out as strict and independent testing of functionalities of medical devices as possible and to obtain the most accurate and reliable diagnosis and patient treatment. This paper presents the results of study conducted by the Institute of Metrology of Bosnia and Herzegovina (IMBIH) that highlight the necessity of introducing metrology into medicine and defining standard regulations for inspections of medical devices. As it has been previously done for other kinds of devices that are under jurisdiction of the Institute of Metrology of BH, this research provides a foundation for the introduction of medical devices into the legal metrology system with precisely defined units of measurement, their ranges and errors. The study was based upon data collected through three clinical centers, 25 hospitals, 63 health centers and 320 private health institutions in BH over the course of one year. As a result of this study, the medical devices that have been introduced into the legal metrology system in BH include ECG devices, defibrillators, patient monitors, respirators, anesthesia machines, dialysis machines, pediatric and neonatal incubators, therapeutic ultrasounds, infusion pumps and perfusors. Furthermore, standard inspection regulations for the aforementioned medical devices are also defined. Additionally, a national laboratory for the inspection of medical devices was established and it currently operates under the ISO 17020 standard. With the introduction of medical devices into the legal metrology system and with the establishment of a fully operational national laboratory for inspection of medical devices, we expect that the reliability of medical devices in diagnosis and patient care will increase and that the costs of the health care system in BH will be reduced.



Standards related to Metrology

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IEEE Guide for Measurement of Environmental Sensitivities of Standard Frequency Generators

This project is a revision of the existing guide for measurements of environmental sensitivities of standard frequency generators. It includes effects and metrology of acceleration; temperature, humidity, and pressure; electrical and magnetic fields; ionizing and particle radiation; and aging, warm-up time and retrace.


IEEE Standard Definitions of Physical Quantities for Fundamental Frequency and Time Metrology--Random Instabilities