IEEE Organizations related to Optical Engineering

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Conferences related to Optical Engineering

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2020 Optical Fiber Communications Conference and Exhibition (OFC)

The Optical Fiber Communication Conference and Exhibition (OFC) is the largest global conference and exhibition for optical communications and networking professionals. For over 40 years, OFC has drawn attendees from all corners of the globe to meet and greet, teach and learn, make connections and move business forward.OFC attracts the biggest names in the field, offers key networking and partnering opportunities, and provides insights and inspiration on the major trends and technology advances affecting the industry. From technical presentations to the latest market trends and predictions, OFC is a one-stop-shop.


2019 24th OptoElectronics and Communications Conference (OECC) and 2019 International Conference on Photonics in Switching and Computing (PSC)

OECC/PSC is one of the biggest worldwide conference on the optical communication, interconnects, and switching technologies. The scope includes optoelectronic components and devices, optical systems, optical interconnects, transmission, and networking.


2018 20th International Conference on Transparent Optical Networks (ICTON)

ICTON addresses applications of transparent and all optical technologies in telecommunication networks, systems, and components. ICTON topics are well balanced between basic optics and network engineering. Interactions between those two groups of professionals are a valuable merit of conference. ICTON combines high level invited talks with carefully selected regular submissions.


2018 Asia Communications and Photonics Conference (ACP)

Photonics-related physical phenomena and effects, photonic device and integration, optical communications, transmission system and networks, photonic sensors, photonics for energy, radio-over fiber system, optical measurements & metrology.

  • 2017 Asia Communications and Photonics Conference (ACP)

    Asia Communications and Photonics Conference (ACP) is currently the largest conference in Asia-Pacific region on optical communications, photonics, optical sensing and relevant optoelectronic technologies. ACP comes from APOC and AOE, and it has been held annually tracing back to 2001.

  • 2016 Asia Communications and Photonics Conference (ACP)

    ACP Track 1: Novel Fibers and Fiber-based DevicesACP Track 2: Optical Transmission Systems, Subsystems and TechnologiesACP Track 3:Network Architectures, Management and ApplicationsACP/POEM Joint Track 4: Optoelectronic devices and IntegrationACP/POEM Joint Track 5: Optical Signal Processing and Microwave PhotonicsACP/POEM Joint Track 6: Photonics for EnergyACP/POEM Joint Track 7: Ultrafast Photonics and Optical StorageACP/PIBM Joint Track 8: Photonics in Biology and Medicine

  • 2014 Asia Communications and Photonics Conference (ACP)

    Optoelectronic Materials, Devices, and IntegrationNovel Fibers and Fiber-based DevicesOptical Transmission Systems, Subsystems, and TechnologiesNetwork Architectures, Management, and ApplicationsBiophotonics and Optical SensorsDisplays, Solid-State Lighting, Photovoltaics, and Energy-Efficient Photonics

  • 2012 Asia Communications and Photonics Conference (ACP 2012)

    Asia Communications and Photonics Conference (ACP) is Asia's premier conference in the Pacific Rim for photonics technologies, including optical communications, biophotonics, nanophotonics, illumination and applications in energy.

  • 2011 Asia Communications and Photonics Conference and Exhibition (ACP 2011)

    Asia Communications and Photonics Conference and Exhibition (ACP) is Asia's premier conference and exhibition in the Pacific Rim for photonics technologies, including optical communications, biophotonics, displays, illumination and applications in energy. The event will take place 13-16 November 2011 in Shanghai, China, at the Shanghai International Convention Center & Oriental Riverside Hotel. The five technical societies -- SPIE, The IEEE Photonics Society, OSA, the Chinese Optical Society, and the Chinese Institute of Communications -- have joined together to co-sponsor the ACP 2011 conference. The Local Organizing Committee with participation from Shanghai Institute of Optics and Fine Mechanics and Shanghai University will be responsible for local organization of the technical conference. Wen Global Solutions will continue as owner of the exhibition.

  • 2010 Asia Communications and Photonics Conference and Exhibition (ACP 2010)

    The Asia Optical Fiber Communication & Optoelectronic Exposition & Conference (AOE) and Asia -Pacific Optical Communications (APOC) have merged their conferences and tradeshow under a new name: Asia Communications and Photonics Conference and Exhibition (ACP).The combined event creates Asia's premier conference and exhibition in the Pacific Rim for photonics technologies, including optical communications, biophotonics, displays, illumination and applications in energy.

  • 2009 Asia Communications and Photonics Conference and Exhibition (ACP 2009)

    The Asia Optical Fiber Communication & Optoelectronic Exposition & Conference (AOE) and Asia-Pacific Optical Communications (APOC) have merged their conferences and tradeshow under a new name: Asia Communications and Photonics Conference and Exhibition (ACP).The combined event creates Asia's premier conference and exhibition in the Pacific Rim for photonics technologies, including optical communications, biophotonics, displays, illumination and applications in energy.

  • 2008 Asia Optical Fiber Communication & Optoelectronic Exposition & Conference (AOE)

    Optical Fiber Communications and Optoelectronics

  • 2007 Asia Optical Fiber Communication & Optoelectronic Exposition & Conference (AOE)

  • 2006 Asia Optical Fiber Communication & Optoelectronic Exposition & Conference (AOE)


2018 Conference on Lasers and Electro-Optics (CLEO)

CLEO continues to be the world’s premier international forum for scientific and technical optics, uniting the fields of lasers and optoelectronics by bringing together all aspects of laser technology, from basic research to industry applications. CLEO provides a forum where attendees can explore new scientific ideas, engineering concepts, and emerging applications in fields such as biophotonics, optical communications and novel light sources. The CLEO Technical Program Committee maintains a rigorous peer review system that emphasizes and maintains high technical quality in all presentations.


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Periodicals related to Optical Engineering

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Most published Xplore authors for Optical Engineering

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Xplore Articles related to Optical Engineering

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Model-assisted Linear Extended State Observer for Opto-Electronic Stabilized Platform

2019 34rd Youth Academic Annual Conference of Chinese Association of Automation (YAC), 2019

In this paper, a control strategy with a model-assisted linear extended state observer (MLESO) is proposed to enhance the disturbance suppression performance for Opto-Electronic stabilized platform. First, we incorporate known model information which can be identified from the open loop frequency response of controlled plant in the framework of the presented linear extended state observer (LESO), for the degree and ...


Sliding Mode Control of the Optoelectronic Stabilized Platform Based on the Exponential Approach Law

2019 34rd Youth Academic Annual Conference of Chinese Association of Automation (YAC), 2019

As the tracking target of the optoelectronic tracking system changes, higher requirements are placed on the tracking accuracy of the optoelectronic tracking system. The optoelectronic tracking system will be subjected to various nonlinear disturbances during the actual operation, which affects the tracking accuracy of the system. In the process of designing traditional PID controllers, the nonlinear factors existing in the ...


Highly selective etch of silicon dioxide with tungsten hard mask deposited by PVD process

2018 18th International Workshop on Junction Technology (IWJT), 2018

The tungsten (W) film deposited by physical vapor deposition (PVD) is a option of hard mask on SiO2 film for nano-patterning. To enhance deep etching of SiO2, hard masks are widely used for its high selectivity. We studied different parameters in SiO2 reactive ion etch (RIE) process such as power, gas chemistries (CHF3/Ar/O2) and pressure that influence the selectivity of ...


Deep-Learning-Based Imaging through Glass-Air Disordered Fiber with Transverse Anderson Localization

2018 Conference on Lasers and Electro-Optics (CLEO), 2018

We demonstrate for the first time that deep neural networks (DNNs) can be trained to recover images transported through a 90 cm-long silica-air disordered optical fiber at variable working distances without any distal optics.


Comparison of different modulation techniques for optical OFDM Intensity Modulation and Direct Detection IM/DD system

2019 IEEE 7th Palestinian International Conference on Electrical and Computer Engineering (PICECE), 2019

In this article, we have demonstrated an Optical Orthogonal Frequency Division Multiplexing (OFDM) Intensity Modulation and Direct Detection (IM/DD) system with different modulation techniques such as Quadrature Amplitude Modulation (QAM) and Phase Shift Keying (PSK). 16 QAM and 16 PSK modulation with different number of subcarriers are applied to IM/DD system to achieve the best Bit Error Rate (BER) performance. ...


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Educational Resources on Optical Engineering

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IEEE.tv Videos

An IEEE IPC Special Session with Kasia Balakier of UCL
Optically Interconnected Extreme Scale Computing - Keren Bergman Plenary from the 2016 IEEE Photonics Conference
IEEE IPC Special Session with Domanic Lavery of UCL
2013 IEEE Alexander Graham Bell Medal
2013 IEEE Edison Medal
Implantable, Insertable and Wearable Micro-optical Devices for Early Detection of Cancer - Plenary Speaker, Christopher Contag - IPC 2018
Light Our Future - IEEE Photonics Society
Smarter Smartphone Imaging - Erik Douglas - IEEE EMBS at NIH, 2019
IMS 2011 Microapps - Ultra Low Phase Noise Measurement Technique Using Innovative Optical Delay Lines
Multi-Level Optimization for Large Fan-In Optical Logic Circuits - Takumi Egawa - ICRC 2018
An Energy-efficient Reconfigurable Nanophotonic Computing Architecture Design: Optical Lookup Table - IEEE Rebooting Computing 2017
Lighting the Way: Optical Sensors in the Life Sciences
On-chip Passive Photonic Reservoir Computing with Integrated Optical Readout - IEEE Rebooting Computing 2017
Multi-Level Optical Weights in Integrated Circuits - IEEE Rebooting Computing 2017
Spatial-Spectral Materials for High Performance Optical Processing - IEEE Rebooting Computing 2017
Demonstration of a Coherent Tunable Amplifier for All-Optical Ising Machines: IEEE Rebooting Computing 2017
Towards On-Chip Optical FFTs for Convolutional Neural Networks - IEEE Rebooting Computing 2017
Nanotechnology For Electrical Engineers
An Integrated Optical Parallel Multiplier Exploiting Approximate Binary Logarithms - Jun Shiomi - ICRC 2018
What members say about IEEE Communications Society

IEEE-USA E-Books

  • Model-assisted Linear Extended State Observer for Opto-Electronic Stabilized Platform

    In this paper, a control strategy with a model-assisted linear extended state observer (MLESO) is proposed to enhance the disturbance suppression performance for Opto-Electronic stabilized platform. First, we incorporate known model information which can be identified from the open loop frequency response of controlled plant in the framework of the presented linear extended state observer (LESO), for the degree and high order gain of the controlled plant are enough. The tuning parameters of observer gain and controller gain are reduced to two: observer bandwidth and controller bandwidth. Then, constructing a MLESO can estimate and compensate the generalized disturbance to stabilize line of sight (LOS). Simulation results indicate that system with MLESO shows a stronger disturbance rejection ability in low and medium frequency by a simple linear PD control law, compared with traditional single position closed-loop control system.

  • Sliding Mode Control of the Optoelectronic Stabilized Platform Based on the Exponential Approach Law

    As the tracking target of the optoelectronic tracking system changes, higher requirements are placed on the tracking accuracy of the optoelectronic tracking system. The optoelectronic tracking system will be subjected to various nonlinear disturbances during the actual operation, which affects the tracking accuracy of the system. In the process of designing traditional PID controllers, the nonlinear factors existing in the system are often neglected. The controller designed by this method is difficult to improve the tracking accuracy of the system. Therefore, in order to improve the tracking accuracy of the optoelectronic tracking system, the primary task is to improve the anti-disturbance capability of the system. This paper uses a sliding mode controller, which has the advantages of fast response, insensitivity to parameter changes and disturbances, to suppress the interference of external disturbances on the system. Among them, the sliding model surface adds the integral term of the position error, and the control law adopts the improved exponential approach law, which effectively suppresses the chattering phenomenon of the sliding mode controller and improves the anti-disturbing ability of the optoelectronic tracking system. The simulation results verify the effectiveness and superiority of the sliding mode control strategy designed in this paper.

  • Highly selective etch of silicon dioxide with tungsten hard mask deposited by PVD process

    The tungsten (W) film deposited by physical vapor deposition (PVD) is a option of hard mask on SiO2 film for nano-patterning. To enhance deep etching of SiO2, hard masks are widely used for its high selectivity. We studied different parameters in SiO2 reactive ion etch (RIE) process such as power, gas chemistries (CHF3/Ar/O2) and pressure that influence the selectivity of SiO2/W. It is revealed that with the increase of RF power, the etching rate of SiO2 and the selectivity increase continually. With the increase of work pressure, the selectivity decreases greatly. Ar and O2 play important roles in the process. And a selectivity of SiO2 film to W hard mask of 78:1 is realized in this work, which shows great potential of W as a hard mask in application.

  • Deep-Learning-Based Imaging through Glass-Air Disordered Fiber with Transverse Anderson Localization

    We demonstrate for the first time that deep neural networks (DNNs) can be trained to recover images transported through a 90 cm-long silica-air disordered optical fiber at variable working distances without any distal optics.

  • Comparison of different modulation techniques for optical OFDM Intensity Modulation and Direct Detection IM/DD system

    In this article, we have demonstrated an Optical Orthogonal Frequency Division Multiplexing (OFDM) Intensity Modulation and Direct Detection (IM/DD) system with different modulation techniques such as Quadrature Amplitude Modulation (QAM) and Phase Shift Keying (PSK). 16 QAM and 16 PSK modulation with different number of subcarriers are applied to IM/DD system to achieve the best Bit Error Rate (BER) performance. According to best BER, the downstream data rate and transmission distance were choosing to be 10 Gbps and 100 km, respectively. Compared with other modulation techniques, IM/DD system with 16 QAM and 128 subcarriers achieved the best BER performance.

  • Comment on “A Broadband Terahertz Metamaterial Absorber Based on Two Circular Split Rings”

    In a published report, Pan et al. presented a broadband terahertz metamaterial absorber(BTMA)to obtain a broadband absorption with a stability at the wide angle of incidence. In this article, we discover that the absorption rate of the proposed absorber is wrongly calculated because of the negligence of the cross-polarization reflection component. In fact, the absorption peaks are only 30.12% and 50.72% at 0.85 THz and 1.93 THz, respectively. The researchers proposed an absorber with poor performance.

  • The PI Control Method in the Input Multi-rate Digital Control System with Low Sample-rate Sensors

    The low sample-rate of the sensors limit the control performance of the control system. The traditional control methods such as PI control method can provide little extra effect to improve the system's control property. Thus, the input multi-rate digital control system with PI controller is proposed and analyzed in this paper to improve the system's property, which adopts the low sample-rate sensors. The controlled object is discretized as an input multi- rate digital control system. We propose the design method of the multi-rate PI controller, which can be used in the input multi-rate digital control system. The Lyapunov stability criterion is used to guarantee the stabilization of the closed-loop input multi-rate digital control system. The Schur complement is utilized to solve the Linear Matrix Inequalities and to calculate the parameters of the proposed multi-rate PI controller. In the end, the simulations proved the validity of the proposed PI controller in the input multi-rate digital control system, which can help the system have a faster response speed.



Standards related to Optical Engineering

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No standards are currently tagged "Optical Engineering"