Conferences related to Electrons

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2015 IEEE International Conference on Plasma Sciences (ICOPS)

Basic Processes in Fully and Partially Ionized Plasmas; Microwave Generation and Plasma Interactions; Charged Particle Beams and Sources; High Energy Density Plasmas and Applications; Industrial, Commercial, and Medical Plasma Applications; Plasma Diagnostics; Pulsed Power and other Plasma Applications.

  • 2012 IEEE 39th International Conference on Plasma Sciences (ICOPS)

    Fully and partially ionized plasmas, microwave-plasma interaction, charged particle beams and sources; high energy density plasmas and applications, industrial and medical applications of plasmas; plasma diagnostics; pulsed power and other plasma applictions

  • 2011 IEEE 38th International Conference on Plasma Sciences (ICOPS)

    The ICOPS is the state of the art plasma science conference that covers all aspects of the general plasma science and its applications in various research fields.

  • 2010 IEEE 37th International Conference on Plasma Sciences (ICOPS)

  • 2009 IEEE 36th International Conference on Plasma Sciences (ICOPS)

    The conference features an exciting technical program with reports from around the globe about new and innovative developments in the field of pulsed power, plasma science and engineering. Leading researchers gather to explore pulsed power plasmas, basic plasma physics, high-energy-density-plasmas, inertial confinement fusion, magnetic fusion, plasma diagnostics, microwave generation, lighting, micro and nano applications of plasmas, medical applications and plasma processing.

  • 2008 IEEE 35th International Conference on Plasma Sciences (ICOPS)

    The 35th IEEE International Conference on Plasma Science will feature an exciting technical program with reports from around the globe about new and innovative developments in the field of plasma science and engineering: 1. Basic processes in fully and partially ionized plasmas 2. Microwave generation and plasma interactions 3. Charged particle beams and sources 4. High energy density plasmas applications 5. Industrial, commercial and medical plasma applications 6. Plasma diagnostics 7. Pulsed power

  • 2007 IEEE 34th International Conference on Plasma Science (ICOPS)

  • 2006 IEEE 33rd International Conference on Plasma Sciences (ICOPS)


2012 XXVth International Symposium on Discharges and Electrical Insulation in Vacuum (ISDEIV 2012)

The program of the Symposium covers a wide range of scientific and technical areas including vacuum breakdown, vacuum arc physics, pulse power physics and technology, vacuum interrupters and their applications.


2008 International Conference on Smart Manufacturing Application (ICSMA)

2008 ICSMA will bring together researchers, engineers and practitioners to present the latest accomplishments, innovations and potential future directions in instrumentation, control, automation, information technology, systems, and their applications.



Periodicals related to Electrons

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Plasma Science, IEEE Transactions on

Plasma science and engineering, including: magnetofluid dynamics and thermionics; plasma dynamics; gaseous electronics and arc technology; controlled thermonuclear fusion; electron, ion, and plasma sources; space plasmas; high-current relativistic electron beams; laser-plasma interactions; diagnostics; plasma chemistry and colloidal and solid-state plasmas.



Most published Xplore authors for Electrons

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Xplore Articles related to Electrons

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RF discharge in the transverse magnetic field numerical model

A. V. Lukyanova; A. T. Rakhimov; N. V. Suetin IEEE Transactions on Plasma Science, 1991

A numerical model of RF discharges in a steady transverse magnetic field is developed. This model is valid in a range of parameters (gas pressure, magnetic field, RF voltage) used in a number of experimental and technical installations. The comparison between numerical calculations and some experimental results is presented


Model of magnetically enhanced, capacitive RF discharges

M. A. Lieberman; A. J. Lichtenberg; S. E. Savas IEEE Transactions on Plasma Science, 1991

Magnetically enhanced, capacitive RF discharges (called RF magnetrons or MERIE discharges) are playing an increasing role in thin film etching for integrated circuit processing. In these discharges, a weak DC magnetic field is imposed, lying parallel to the powered electrode surface. The authors determine the RF power transferred to the discharge electrons by the oscillating electron sheath in the presence ...


A two-electron group model theory for radio-frequency ionization of noble gases with turbulent flow

M. E. Talaat IEEE Transactions on Plasma Science, 1991

Equations are derived for predicting the current-voltage characteristic curves of axial RF discharges in noble gases, with turbulent flow. The electrons are considered to be made up of two Maxwellian groups: bulk and tail electrons. The bulk electrons are described by a temperature Tb, and have kinetic energies (1/2 mv2=eV) from 0 to eV l (eVl=the threshold energy of the ...


Calculation of the auto-bias voltage for RF frequencies well above the ion-plasma frequency

P. M. Meijer; W. J. Goedheer IEEE Transactions on Plasma Science, 1991

A model is presented which describes the coupling of the two RF sheaths in the high-frequency regime for a reactor with different electrodes. The sheaths are coupled by the current-balance equation and the assumption of a harmonic potential difference between the two electrodes. In contrast with most existing models, no assumption is made for either the displacement current or the ...


A self-consistent particle model for the simulation of RF glow discharges

H. W. Trombley; F. L. Terry; M. E. Elta IEEE Transactions on Plasma Science, 1991

A self-consistent particle model of an argon RF glow discharge has been developed. Electric field and charged-particle density profiles determined from simulations with the RF glow discharge model are consistent with results obtained from continuum models. The average ion energy is found to vary greatly between the bulk of the discharge and sheaths, contrary to the assumption that the ion ...


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Educational Resources on Electrons

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eLearning

RF discharge in the transverse magnetic field numerical model

A. V. Lukyanova; A. T. Rakhimov; N. V. Suetin IEEE Transactions on Plasma Science, 1991

A numerical model of RF discharges in a steady transverse magnetic field is developed. This model is valid in a range of parameters (gas pressure, magnetic field, RF voltage) used in a number of experimental and technical installations. The comparison between numerical calculations and some experimental results is presented


Model of magnetically enhanced, capacitive RF discharges

M. A. Lieberman; A. J. Lichtenberg; S. E. Savas IEEE Transactions on Plasma Science, 1991

Magnetically enhanced, capacitive RF discharges (called RF magnetrons or MERIE discharges) are playing an increasing role in thin film etching for integrated circuit processing. In these discharges, a weak DC magnetic field is imposed, lying parallel to the powered electrode surface. The authors determine the RF power transferred to the discharge electrons by the oscillating electron sheath in the presence ...


A two-electron group model theory for radio-frequency ionization of noble gases with turbulent flow

M. E. Talaat IEEE Transactions on Plasma Science, 1991

Equations are derived for predicting the current-voltage characteristic curves of axial RF discharges in noble gases, with turbulent flow. The electrons are considered to be made up of two Maxwellian groups: bulk and tail electrons. The bulk electrons are described by a temperature Tb, and have kinetic energies (1/2 mv2=eV) from 0 to eV l (eVl=the threshold energy of the ...


Calculation of the auto-bias voltage for RF frequencies well above the ion-plasma frequency

P. M. Meijer; W. J. Goedheer IEEE Transactions on Plasma Science, 1991

A model is presented which describes the coupling of the two RF sheaths in the high-frequency regime for a reactor with different electrodes. The sheaths are coupled by the current-balance equation and the assumption of a harmonic potential difference between the two electrodes. In contrast with most existing models, no assumption is made for either the displacement current or the ...


A self-consistent particle model for the simulation of RF glow discharges

H. W. Trombley; F. L. Terry; M. E. Elta IEEE Transactions on Plasma Science, 1991

A self-consistent particle model of an argon RF glow discharge has been developed. Electric field and charged-particle density profiles determined from simulations with the RF glow discharge model are consistent with results obtained from continuum models. The average ion energy is found to vary greatly between the bulk of the discharge and sheaths, contrary to the assumption that the ion ...


More eLearning Resources

IEEE-USA E-Books

  • The Questionable Matter of Electricity: The Reception of J.J. Thompson's “Corpuscle” Among Electrical Theorists and Technologists

    This chapter contains sections titled: The Electrician and the Question Concerning Electricity, Dissociation and Indifference: Varied Responses to Thompson's 1897 Researches, Converts and Appropriators at the BAAS Meeting of 1899, New Territories and New Audiences for the Electron and Corpuscle, The Autonomy of Hardware--or Not Harnessing the "Electron" in New Technologies, Thompson vs. Thompson: The Contested Relation Between Corpuscles and Electrons, Epilogue: The Invention of Discovery Stories for the "Electron", Conclusion: A New Uncertainty Principle, Notes

  • The Electron and the Nucleus

    This chapter contains sections titled: Nuclear Electrons to 1932, Heisenberg's N-P Nuclear Model and the Electron, The Role of Cosmic-Ray Multiplicity in Heisenberg's Thinking About Nuclear Electrons, Provisional Solution of the Electron-Nucleus Problem, Are there Electrons in the Nucleus or Not?, Notes, References

  • Basic Spintronic Transport Phenomena

    Spintronics is a merger of magnetism and electronics. It uses the spin of electrons in addition to their charge to obtain new properties and uses these properties in innovative devices. This chapter introduces three major spintronics phenomena, which form the basis of most spintronics devices: giant magnetoresistance, tunneling magnetoresistance, and spin???transfer torque.

  • Optoelectronic Devices

    This chapter covers the advances on semiconductor devices that manipulate light, convert photons to electrons, and their applications. Some devices are designed for generation of light. The materials used in all these devices have steered the applications from communications, to medical instrumentation, scanners, and consumer electronics in a way thatsemiconductor optoelectronics became ubiquitous.

  • What Was The Newborn Electron Good For?

    In the mid to late 1890s, J. J. Thomson and colleagues at Cambridge's Cavendish Laboratory conducted experiments on "cathode rays" (a form of radiation produced within evacuated glass vessels subjected to electric fields) -- the results of which some historians later viewed as the "discovery" of the electron. This book is both a biography of the electron and a history of the microphysical world that it opened up.The book is organized in four parts. The first part, Corpuscles and Electrons, considers the varying accounts of Thomson's role in the experimental production of the electron. The second part, What Was the Newborn Electron Good For?, examines how scientists used the new entity in physical and chemical investigations. The third part, Electrons Applied and Appropriated, explores the accommodation, or lack thereof, of the electron in nuclear physics, chemistry, and electrical science. It follows the electron's gradual progress from cathode ray to ubiquitous subatomic particle and eponymous entity in one of the world's most successful industries -- electronics. The fourth part, Philosophical Electrons, considers the role of the electron in issues of instrumentalism, epistemology, and realism. The electron, it turns out, can tell us a great deal about how science works.

  • Voltage and Capacitance

    This chapter contains sections titled: Introduction Charges and Electrons The Electric Force Field Field Representations The Definition of Voltage Equipotential Surfaces The Electric Force Field between Two Conducting Plates Electric Field Patterns The Energy Stored in an Electric Field Dielectrics The D Field Capacitance Mutual Capacitance Displacement Current Energy Stored in a Capacitor Forces in the Electric Field Capacitors

  • Electrons and Holes: Much From Little

    This chapter contains sections titled: A Name for a New Field Semiconductors: Key to Solid-State Electronics Developments During World War II Why Transistors? The Three Inventors The Minority Movement in Semiconductors The Point-Contact Transistor is Invented The P-N Junction: Key to the Junction Transistor The Junction Transistor Achievements of the Junction Transistor Changing forms of the Junction Transistor Transistors, Et Cetera, on a Chip How Integrated Circuits are Made The Many Uses of Solid-State Electronics For Further Reading

  • Concurrent Engineering and Science

    This chapter contains sections titled: Engineering: The Dawn of Physics: From Mystery to Determinism, Engineering-Enabled Science: Quantum Physics, 1880-1930, The Start: X-Rays, Discovering the Nucleus of the Atom, Measuring the Charge of Electrons, Physics at Lawrence Radiation Laboratory, 1930 to Today, Engineering and Astrophysics: Creating the Hubble Space Telescope

  • Diamagnetism and Paramagnetism

    This chapter contains sections titled: Introduction Magnetic Moments of Electrons Magnetic Moments of Atoms Theory of Diamagnetism Diamagnetic Substances Classical Theory of Paramagnetism Quantum Theory of Paramagnetism Paramagnetic Substances Problems

  • Remodeling A Classic: The Electron in Organic Chemistry, 1900–1940

    This chapter contains sections titled: The Electron and Chemical Valence, Reaction Mechanisms in Organic Chemistry, Conclusion: Chemical Electrons and Chemical Revolution, Notes



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