Contact resistance

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The term contact resistance refers to the contribution to the total resistance of a material which comes from the electrical leads and connections as opposed to the intrinsic resistance, which is an inherent property, independent of the measurement method. (Wikipedia.org)

Conferences related to Contact resistance

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2015 IEEE International Conference on Plasma Sciences (ICOPS)

Basic Processes in Fully and Partially Ionized Plasmas; Microwave Generation and Plasma Interactions; Charged Particle Beams and Sources; High Energy Density Plasmas and Applications; Industrial\, Commercial\, and Medical Plasma Applications; Plasma Diagnostics; Pulsed Power and other Plasma Applications.

  • 2012 IEEE 39th International Conference on Plasma Sciences (ICOPS)

    Fully and partially ionized plasmas, microwave-plasma interaction, charged particle beams and sources; high energy density plasmas and applications, industrial and medical applications of plasmas; plasma diagnostics; pulsed power and other plasma applictions

  • 2011 IEEE 38th International Conference on Plasma Sciences (ICOPS)

    The ICOPS is the state of the art plasma science conference that covers all aspects of the general plasma science and its applications in various research fields.

  • 2010 IEEE 37th International Conference on Plasma Sciences (ICOPS)

  • 2009 IEEE 36th International Conference on Plasma Sciences (ICOPS)

    The conference features an exciting technical program with reports from around the globe about new and innovative developments in the field of pulsed power, plasma science and engineering. Leading researchers gather to explore pulsed power plasmas, basic plasma physics, high-energy-density-plasmas, inertial confinement fusion, magnetic fusion, plasma diagnostics, microwave generation, lighting, micro and nano applications of plasmas, medical applications and plasma processing.

  • 2008 IEEE 35th International Conference on Plasma Sciences (ICOPS)

    The 35th IEEE International Conference on Plasma Science will feature an exciting technical program with reports from around the globe about new and innovative developments in the field of plasma science and engineering: 1. Basic processes in fully and partially ionized plasmas 2. Microwave generation and plasma interactions 3. Charged particle beams and sources 4. High energy density plasmas applications 5. Industrial, commercial and medical plasma applications 6. Plasma diagnostics 7. Pulsed power


2012 IEEE 58th Holm Conference on Electrical Contacts (Holm 2012)

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Practicing designers\, engineers\, physicists and research scientists - those new to the field and those experienced. The 2011 Conference will include excellent papers authored by some of the outstanding technical people in this field. The international contributors come from universities and industries in USA\, Austria\, Canada\, Japan\, China\, France\, Switzerland\, Russia\, Germany\, United Kingdom and other countries. These papers will provide the attendees with up-to-date information on a wide range of subjects


TRANSDUCERS 2011 - 2011 16th International Solid-State Sensors, Actuators and Microsystems Conference

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Latest progress in physical, chemical and biological microsensors; Latest development in optical, RF, fluidic, biomedical and power MEMS; Most advanced technologies in micro/nano fabrication, packaging and design


Xplore Articles related to Contact resistance

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  • Theory and experimental measurements of contact resistance

    Tang, W.; Gomez, M.R.; Lau, Y.Y.; Gilgenbach, R.M.; Zier, J. Plasma Science - Abstracts, 2009. ICOPS 2009. IEEE International Conference on, 2009

    Summary form only given. Electrical contact is an important issue for high power microwave sources, wire-array Z pinches, field emitters, and metal-insulator-vacuum junctions. Because of the surface roughness on a microscopic scale, true contact between two pieces of metal occurs only on the asperities of the two contacting surfaces. Current flows only through these asperities, which occupy a small fraction ...

  • Analysis of Contact Resistance Behavior for Electric Contacts with Plating Layer

    Sawada, S.; Shimizu, K.; Hattori, Y.; Tamai, T.; Iida, K. Electrical Contacts (HOLM), 2010 Proceedings of the 56th IEEE Holm Conference on, 2010

    It is very important to predict the force-contact resistance relation for the virtual connector designing. In this study, the prediction of electrical contact resistance in various cases was examined. The specimens consisted of a copper alloy with tin or silver plating. To predict the contact resistance at each contact force, the relationship between contact resistance and contact force were separated ...

  • Complementary Dual-Contact Switch Using Soft and Hard Contact Materials for Achieving Low Contact Resistance and High Reliability Simultaneously

    Song, Y.-H.; Kim, M.-W.; Lee, J.O.; Ko, S.-D.; Yoon, J.-B. Microelectromechanical Systems, Journal of, 2013

    This paper reports a dual-contact microelectromechanical switch, which consists of two contacts in a single switch: one with a soft contact material and the other with a hard contact material to achieve low contact resistance and high reliability at the same time under hot switching conditions. In a single switching operation, the proposed dual-contact switch makes contact twice in sequence, ...

  • Z-pinch wire-contact resistance reduction using clamped and soft metal contacts

    Gomez, M.R.; Zier, J.; French, D.M.; Gilgenbach, R.M.; Tang, W.; Lau, Y.Y. Plasma Science, 2008. ICOPS 2008. IEEE 35th International Conference on, 2008

    The contact resistance in a wire array z-pinch has a significant affect on both the level and uniformity of energy deposition in the wires. Typically wires are held taut against the electrodes by wire weights (-1-10 g depending on wire material and diameter). This can lead to contact resistance values of -90-99% of the load resistance. Previous techniques to reduce ...

  • Electrical contact resistance as a diagnostic tool for MEMS contact interfaces

    Lumbantobing, A.; Kogut, L.; Komvopoulos, K. Microelectromechanical Systems, Journal of, 2004

    The electrical contact resistance (ECR) was evaluated as an in situ diagnostic tool for the contact interface behavior of microelectromechanical systems (MEMS). Special polycrystalline silicon (polysilicon) MEMS devices fabricated by surface micromachining were used to study polysilicon/native oxide/polysilicon contact interfaces. ECR measurements obtained during monotonic contact loading and unloading and cyclic contact loading are interpreted in the context of a ...

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Periodicals related to Contact resistance

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  • Components and Packaging Technologies, IEEE Transactions on

    Component parts, hybrid microelectronics, materials, packaging techniques, and manufacturing technology.

  • Microelectromechanical Systems, Journal of

    A journal covering Microsensing, Microactuation, Micromechanics, Microdynamics, and Microelectromechanical Systems (MEMS). Contains articles on devices with dimensions that typically range from macrometers to millimeters, microfabrication techniques, microphenomena; microbearings, and microsystems; theoretical, computational, modeling and control results; new materials and designs; tribology; microtelemanipulation; and applications to biomedical engineering, optics, fluidics, etc. The Journal is jointly sponsored by the IEEE Electron Devices ...

  • Semiconductor Manufacturing, IEEE Transactions on

    Addresses innovations of interest to the integrated circuit manufacturing researcher and professional. Includes advanced process control, equipment modeling and control, yield analysis and optimization, defect control, and manufacturability improvement. It also addresses factory modelling and simulation, production planning and scheduling, as well as environmental issues in semiconductor manufacturing.