Metrology

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This article is about the science of measurement. (Wikipedia.org)






Conferences related to Metrology

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2014 IEEE International Instrumentation and Measurement Technology Conference (I2MTC)

The Conference focuses on all aspects of instrumentation and measurement science and technology research, development and applications. The list of program topics includes but is not limited to: Measurement Science & Education, Measurement Systems, Measurement Data Acquisition, Measurements of Physical Quantities, and Measurement Applications.

  • 2013 IEEE International Instrumentation and Measurement Technology Conference (I2MTC)

    The Conference focuses on all aspects of instrumentation and measurement science and technology research, development and applications. The list of program topics includes but is not limited to MEASUREMENT SCIENCE & EDUCATION, MEASUREMENT SYSTEMS, MEASUREMENT -DATA ACQUISITION, MEASUREMENTS OF PHYSICAL QUANTITIES, and MEASUREMENT APPLICATIONS.

  • 2012 IEEE International Instrumentation and Measurement Technology Conference (I2MTC)

    The conference focuses on research, development and applications in the field of instrumentation and measurement science and technology. The list of program topics includes but is not limited to Fundamentals, Sensors & Transducers, Measurements of Physical Qualities, Measurement Systems, Measurement Applications, Signal & Image Processing, and Industrial Applications.

  • 2011 IEEE International Instrumentation and Measurement Technology Conference (I2MTC)

    The Conference focuses on all aspects of instrumentation and measurement science and technology research, development and applications. The list of program topics includes but is not limited to MEASUREMENT SCIENCE & EDUCATION, MEASUREMENT SYSTEMS, MEASUREMENT -DATA ACQUISITION, MEASUREMENTS OF PHYSICAL QUANTITIES, and MEASUREMENT APPLICATIONS.

  • 2010 IEEE Instrumentation & Measurement Technology Conference - I2MTC 2010

    The Conference focuses on all aspects of instrumentation and measurement science and technology research, development and applications. The list of program topics includes but is not limited to MEASUREMENT SCIENCE & EDUCATION, MEASUREMENT SYSTEMS, MEASUREMENT -DATA ACQUISITION, MEASUREMENTS OF PHYSICAL QUANTITIES, and MEASUREMENT APPLICATIONS.

  • 2009 IEEE Instrumentation & Measurement Technology Conference - I2MTC 2009

    The Conference focuses on all aspects of instrumentation and measurement science and technology research, development and applications. The list of program topics includes but is not limited to MEASUREMENT SCIENCE & EDUCATION, MEASUREMENT SYSTEMS, MEASUREMENT-DATA ACQUISITION, MEASUREMENTS OF PHYSICAL QUANTITIES, and MEASUREMENT APPLICATIONS.


2014 IEEE Semiconductor Wafer Test Workshop (SWTW 2014)

The IEEE SW Test Workshop is the only workshop specializing in semiconductor wafer level testing. It has a comprehensive technical program that is comnplemented by social activities which promote networking and sharing among the attendees. Booth displays at SWTW provide attendees with a one -stop opportunity to meet in person with all the key suppiers and learn about their new products and services.

  • 2013 IEEE Semiconductor Wafer Test Workshop (SWTW 2013)

    The IEEE SW Test Workshop is the only workshop specializing in semiconductor wafer level testing. It has a comprehensive technical program that is complemented by social activities which promote networking and sharing among the attendees. Booth displays at SWTW provide attendees with a on-stop opportunity to meet firsthand with all the key suppliers and learn about their new products and services.

  • 2012 IEEE Semiconductor Wafer Test Workshop (SWTW 2012)

    The IEEE SW Test Workshop is the only workshop specializing in semiconductor wafer level testing. It has a comprehensive technical program that is complemented by social activities which promote networking and sharing among the attendees. Booth displays at SWTW provide attendees with a on-stop opportunity to meet firsthand with all the key suppliers and learn about their new products and services.

  • 2011 IEEE Semiconductor Wafer Test Workshop (SWTW 2011)

    The IEEE SW Test Workshop is the only workshop specializing in semiconductor wafer level testing. It has a comprehensive technical program that is complemented by social activities which promote networking and sharing amoung attendees. Exhibit booth displays at SWTW provide attendees with a one-stop opportunity to meet firsthand with all key suppliers and learn about their new products and services.

  • 2010 IEEE Semiconductor Wafer Test Workshop (SWTW 2010)

    The IEEE SW Test Workshop is the only workshop specializing in semiconductor wafer level testing. It has a comprehensive technical program that is complemented by social activities which promote networking and sharing among the attendees. Booth displays at SWTW provide attendees with a one-stop opportunity to meet firsthand with all the key suppliers and learn about their new products and services.

  • 2009 IEEE Semiconductor Wafer Test Workshop (SWTW 2009)

    The IEEE SW Test Workshop is the only workshop specializing in semiconductor wafer level testing. It has a comprehensive technical program that is complemented by social activities which promote networking and sharing among the attendees. Booth displays at SWTW provide attendees with a one-stop opportunity to meet fi rsthand with all the key suppliers and learn about their new products and services.

  • 2008 IEEE Semiconductor Wafer Test Workshop (SWTW 2008)

    The SW Test Workshop is the only IEEE sponsored conference dealing with all aspects of semiconductor wafer and die level probe testing.


2013 81st ARFTG Microwave Measurement Conference (ARFTG)

RF and Microwave Measurement Techniques


2013 Conference on Lasers and Electro-Optics (CLEO)

CLEO serves as the premier international forum for scientific and technical optics, uniting the fields of lasers and opto-electronics by bringing together all aspects of laser technology, from basic research to industry applications.

  • 2012 Conference on Lasers and Electro-Optics (CLEO)

    CLEO 2012 features a complete and up-to-date technical program under three core conferences; CLEO: QELS- Fundamental Science, CLEO: Science & Innovations, and CLEO: Applications & Technology. CLEO: Expo and Market Focus bring CLEO 2012 full circle by highlighting the latest innovations and products as well as providing a forum to discuss marketplace trends and challenges.

  • 2011 Conference on Lasers and Electro-Optics (CLEO)

    CLEO, the Conference on Lasers and Electro-Optics, formerly known as CLEO/QELS, serves as the premier international forum for scientific and technical optics. The CLEO: 2011 Conference unites the fields of lasers and opto-electronics by bringing together all aspects of laser technology, from basic research to industry applications.

  • 2010 Conference on Lasers and Electro-Optics (CLEO)

    CLEO is held in conjunction with the Quantum Electronics and Laser Science Conference. CLEO/QELS attracts leaders in the fields of lasers, optical devices, optical fibers, photonics and innovative approaches in such fields as: laser spectroscopy, ultrafast optics, nonlinear optics, optical detectors, optical modulators, optical pulses, and quantum mechanics.

  • 2009 Conference on Lasers and Electro-Optics (CLEO)

    CLEO has evolved into a dynamic six-day event that has successfully bridged the science and applications sides of the optics and photonics industry. CLEO offers high-quality programming; the latest in the lasers, electro-optics and photonics industry; the CLEO Exhibit, which has over 350 participating companies; and a new location in Baltimore, Maryland. CLEO and PhAST 2008 is the must attend event of the year.

  • 2008 Conference on Lasers and Electro-Optics (CLEO)

    CLEO/QELS and PhAST has evolved into a dynamic six-day event that has successfully bridged the science and applications sides of the optics and photonics industry. CLEO/QELS offers high-quality programming; the latest in the lasers, electro-optics and photonics industry; the CLEO Exhibit, which has over 350 participating companies; and a new location in San Jose, California. CLEO/QELS and PhAST 2008 is the must attend event of the year.

  • 2007 Conference on Lasers & Electro-Optics/Quantum Electronics and Laser Science Conference (CLEO/QELS 2007)

  • 2006 Conference on Lasers & Electro-Optics/Quantum Electronics and Laser Science Conference (CLEO/QELS 2006)


2013 IEEE 11th International Conference on Electronic Measurement & Instruments (ICEMI)

ICEMI is invited authors to submit original papers in any but not limited as following areas: Science Foundation of Instrument and Measurement Innovative Designing of Instrument and Test System Applications on Instrument and Testing Signal & Image Processing Sensor and Non-electric Measurement Communication and Network Test Systems Control Theory and Application Condition Monitoring, Fault Diagnosis and Prediction Other Relevant Theories and Technologies

  • 2011 IEEE 10th International Conference on Electronic Measurement & Instruments (ICEMI)

    ICEMI is the world s premier conference dedicated to the electronic test of devices, boards and systems covering the complete cycle from design verification, test, diagnosis, failure analysis and back to process and design improvement, and is convened every two years. The purpose of the ICEMI is to provide excellent opportunities for scientists, engineers, and participants throughout the world to present the latest research results and to exchange their views or experience.

  • 2009 9th International Conference on Electronic Measurement & Instruments (ICEMI 2009)

    Science Foundation of Instrument and Measurement Instrument, Measurement and Test Technology: Sensing Technology and Transducer Designing of Instrument and Test System Applications on Instrument and Testing: Communication and Network Test Systems Control Theory and Application

  • 2007 8th International Conference on Electronic Measurement & Instruments (ICEMI 2007)


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Periodicals related to Metrology

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Advanced Packaging, IEEE Transactions on

The IEEE Transactions on Advanced Packaging has its focus on the modeling, design, and analysis of advanced electronic, photonic, sensors, and MEMS packaging.


Components and Packaging Technologies, IEEE Transactions on

Component parts, hybrid microelectronics, materials, packaging techniques, and manufacturing technology.


Electronics Packaging Manufacturing, IEEE Transactions on

Design for manufacturability, cost and process modeling, process control and automation, factory analysis and improvement, information systems, statistical methods, environmentally-friendly processing, and computer-integrated manufacturing for the production of electronic assemblies, products, and systems.


Semiconductor Manufacturing, IEEE Transactions on

Addresses innovations of interest to the integrated circuit manufacturing researcher and professional. Includes advanced process control, equipment modeling and control, yield analysis and optimization, defect control, and manufacturability improvement. It also addresses factory modelling and simulation, production planning and scheduling, as well as environmental issues in semiconductor manufacturing.




Xplore Articles related to Metrology

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Multiple Access Interference Suppression for TWSTFT Applications

Yi-Jiun Huang; Hen-Wai Tsao; Huang-Tien Lin; Chia-Shu Liao IEEE Transactions on Instrumentation and Measurement, 2017

Multiple access interference (MAI) is one of the unstable sources of the two- way satellite time and frequency transfer (TWSTFT), and causes an estimation error of the signal arrival time. To suppress MAI, the successive interference cancellation (SIC) procedure is implemented on the software-defined receiver. It generates MAIs and subtracts them from the received signal to become an interference-free signal. ...


Uncertainty evaluation of balanced S-parameter measurements

F. Ziadé; M. Hudlička; M. Salter; T. Pavlíček; D. Allal 2016 Conference on Precision Electromagnetic Measurements (CPEM 2016), 2016

This paper describes the development of a calibration kit for measuring the scattering parameters (S-parameters) of balanced devices on a printed circuit board (PCB) substrate as well as the estimated uncertainty up to 25 GHz. The calibration kit is composed of a thru, reflect and a set of transmission lines to calibrate a Vector Network Analyzer (VNA) using the Thru ...


A Dynamic Instrumentation Framework for Remote Operation of PC-Connected Devices

Asmund Sand; Mike Stevens; Graeme Parkin 2006 IEEE Symposium on Virtual Environments, Human-Computer Interfaces and Measurement Systems, 2006

The authors present a dynamic instrumentation framework for remote operation of PC-connected devices. The framework is dynamic in a way such that hardware information can be downloaded and added to the system at runtime. The hardware information consists of high-level hardware drivers and the graphical user interface (GUI) components to communicate with them. The solution makes it easy to maintain ...


QWTB — Software tool box for sampling measurements

Martin Šíra; Stanislav Mašláň; Věra Nováková Zachovalová 2016 Conference on Precision Electromagnetic Measurements (CPEM 2016), 2016

A new software toolbox QWTB is presented. It aims for aggregation of high- quality algorithms required for data processing of sampled measurements. Algorithms include frequency, amplitude and phase estimators, stability quantifiers, flicker calculator etc. The toolbox unifies and simplifies user interface of algorithms and an example for every algorithm is included to help understanding. The toolbox is open-source and an ...


Temperature control of waveguide extenders

Johannes Hoffmann; Daniel Stalder; Michael Wollensack; Juerg Ruefenacht; Markus Zeier 2016 Conference on Precision Electromagnetic Measurements (CPEM 2016), 2016

Waveguide extenders are used for reflection and transmission measurements at frequencies higher than 70 GHz. The extenders produce a lot of heat during operation and thus their test-port temperature rises above 23 degrees Celsius. By using an active cooling system with a large thermal mass, excellent stability and test-port temperatures close to 23 degrees Celsius can be achieved.


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Educational Resources on Metrology

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eLearning

Multiple Access Interference Suppression for TWSTFT Applications

Yi-Jiun Huang; Hen-Wai Tsao; Huang-Tien Lin; Chia-Shu Liao IEEE Transactions on Instrumentation and Measurement, 2017

Multiple access interference (MAI) is one of the unstable sources of the two- way satellite time and frequency transfer (TWSTFT), and causes an estimation error of the signal arrival time. To suppress MAI, the successive interference cancellation (SIC) procedure is implemented on the software-defined receiver. It generates MAIs and subtracts them from the received signal to become an interference-free signal. ...


Uncertainty evaluation of balanced S-parameter measurements

F. Ziadé; M. Hudlička; M. Salter; T. Pavlíček; D. Allal 2016 Conference on Precision Electromagnetic Measurements (CPEM 2016), 2016

This paper describes the development of a calibration kit for measuring the scattering parameters (S-parameters) of balanced devices on a printed circuit board (PCB) substrate as well as the estimated uncertainty up to 25 GHz. The calibration kit is composed of a thru, reflect and a set of transmission lines to calibrate a Vector Network Analyzer (VNA) using the Thru ...


A Dynamic Instrumentation Framework for Remote Operation of PC-Connected Devices

Asmund Sand; Mike Stevens; Graeme Parkin 2006 IEEE Symposium on Virtual Environments, Human-Computer Interfaces and Measurement Systems, 2006

The authors present a dynamic instrumentation framework for remote operation of PC-connected devices. The framework is dynamic in a way such that hardware information can be downloaded and added to the system at runtime. The hardware information consists of high-level hardware drivers and the graphical user interface (GUI) components to communicate with them. The solution makes it easy to maintain ...


QWTB — Software tool box for sampling measurements

Martin Šíra; Stanislav Mašláň; Věra Nováková Zachovalová 2016 Conference on Precision Electromagnetic Measurements (CPEM 2016), 2016

A new software toolbox QWTB is presented. It aims for aggregation of high- quality algorithms required for data processing of sampled measurements. Algorithms include frequency, amplitude and phase estimators, stability quantifiers, flicker calculator etc. The toolbox unifies and simplifies user interface of algorithms and an example for every algorithm is included to help understanding. The toolbox is open-source and an ...


Temperature control of waveguide extenders

Johannes Hoffmann; Daniel Stalder; Michael Wollensack; Juerg Ruefenacht; Markus Zeier 2016 Conference on Precision Electromagnetic Measurements (CPEM 2016), 2016

Waveguide extenders are used for reflection and transmission measurements at frequencies higher than 70 GHz. The extenders produce a lot of heat during operation and thus their test-port temperature rises above 23 degrees Celsius. By using an active cooling system with a large thermal mass, excellent stability and test-port temperatures close to 23 degrees Celsius can be achieved.


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IEEE-USA E-Books

  • Frontmatter

    The prelims comprise: Half Title IEEE Computer society Title Copyright Contents Foreword Preface Acknowledgments About the Author

  • Introduction

    This chapter contains sections titled: Introduction Software Measurement: Is it Mature or Not? Software Measurement as a New Technology The Designs of Software Measures must be Verified Advanced Readings: How much Measurement Support is Recognized within the Software Engineering Body of Knowledge (Swebok)?

  • Process Monitoring

    In order for semiconductor processes to repeatably produce reliable, high- quality devices and circuits, each unit process must be strictly controlled. Many diagnostic tools are used to maintain systematic control. Such control requires that the key output variables for each process step (i.e., those that are correlated with product functionality and performance) be carefully monitored. Process monitoring enables operators and engineers to detect problems early on to minimize their impact. The economic benefit of effective monitoring systems increases with the complexity of the manufacturing process. Manufacturing line monitors consist of extremely sophisticated metrology equipment which can be divided into tools which characterize the state of features on the semiconductor wafers themselves and those which describe the status of the fabrication equipment operating on those wafers. The issues involved in understanding and implementing both wafer state and equipment state measurements will be discussed in detail in this chapter.

  • Reliability Considerations

    This chapter contains sections titled: Introduction Failure Mechanisms Accelerated Testing Reliability Metrology Failure Statistics for Microelectronics Systems The Industrial Practice of Reliability Science for Microelectronics Summary This chapter contains sections titled: Exercises References

  • COSMIC: Design of An Initial Prototype

    This chapter contains sections titled: Introduction Improvement Project Literature Review Design of the Initial Prototype Field Tests of the Prototype First-Year Feedback From Industry Advanced Readings: Key Differences Between FP and the Proposed Extension

  • Appendix B: Glossary of Terms in Software Measurement

    This appendix contains sections titled: Some Measurement Terms in Software Engineering Some Measurement Terms in Metrology - VIM 2007

  • Use Case Points: Analysis of Their Design

    This chapter contains sections titled: Introduction Use Case Points Description Analysis of the UCP Design The Modeling of Relationships of UCP with Project Effort Summary

  • From Measurement Methods to Quantitative Models: A Measurement Context Model

    This chapter contains sections titled: Introduction: Numbers, Measures, and Quantitative Models Measurement Context Model How to Design a Measurement Method Application of a Measurement Method Exploitation of Measurement Results in Quantitative Models Validation or Verification? Advanced Readings : Analysis of the ISO Requirements for the Designs of Functional Size Measurement Methods

  • The Design of Software Measurement Methods

    This chapter contains sections titled: Introduction Linking Software Measurement and Metrology Defining the Measurement Principle Determining the Measurement Method Products of the Measurement Design Phase Post Design Activity: Determining a Measurement Procedure Summary Advanced Readings 1: Verification Criteria for Software Measurement Methods Advanced Readings 2: Relational Structures in Assigning a Numerical Value

  • The Leyden JarThe First Capacitor

    "Joseph F. Keithley, a modern pioneer of instrumentation, brings you a fascinating history of electrical measurement from the ancient Greeks to the inventors of the early twentieth century. Written in a direct and fluent style, the book illuminates the lives of the most significant inventors in the field, including George Simon Ohm, Andre Marie Ampere, and Jean Baptiste Fourier. Chapter by chapter, meet the inventors in their youth and discover the origins of their lifelong pursuits of electrical measurement. Not only will you find highlights of important technological contributions, you will also learn about the tribulations and excitement that accompany the discoveries of these early masters. Included are nearly 100 rare photographs from museums around the world. THE STORY OF ELECTRICAL AND MAGNETIC MEASUREMENTS is a ""must read"" for students and practitioners of physics, electrical engineering, and instrumentation and metrology who want to understand the history behind modern day instruments." Sponsored by: IEEE Instrumentation and Measurement Society



Standards related to Metrology

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IEEE Guide for Measurement of Environmental Sensitivities of Standard Frequency Generators

This project is a revision of the existing guide for measurements of environmental sensitivities of standard frequency generators. It includes effects and metrology of acceleration; temperature, humidity, and pressure; electrical and magnetic fields; ionizing and particle radiation; and aging, warm-up time and retrace.


IEEE Standard Definitions of Physical Quantities for Fundamental Frequency and Time Metrology--Random Instabilities



Jobs related to Metrology

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