Metrology

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This article is about the science of measurement. (Wikipedia.org)






Conferences related to Metrology

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2014 IEEE International Instrumentation and Measurement Technology Conference (I2MTC)

The Conference focuses on all aspects of instrumentation and measurement science and technology research, development and applications. The list of program topics includes but is not limited to: Measurement Science & Education, Measurement Systems, Measurement Data Acquisition, Measurements of Physical Quantities, and Measurement Applications.

  • 2013 IEEE International Instrumentation and Measurement Technology Conference (I2MTC)

    The Conference focuses on all aspects of instrumentation and measurement science and technology research, development and applications. The list of program topics includes but is not limited to MEASUREMENT SCIENCE & EDUCATION, MEASUREMENT SYSTEMS, MEASUREMENT -DATA ACQUISITION, MEASUREMENTS OF PHYSICAL QUANTITIES, and MEASUREMENT APPLICATIONS.

  • 2012 IEEE International Instrumentation and Measurement Technology Conference (I2MTC)

    The conference focuses on research, development and applications in the field of instrumentation and measurement science and technology. The list of program topics includes but is not limited to Fundamentals, Sensors & Transducers, Measurements of Physical Qualities, Measurement Systems, Measurement Applications, Signal & Image Processing, and Industrial Applications.

  • 2011 IEEE International Instrumentation and Measurement Technology Conference (I2MTC)

    The Conference focuses on all aspects of instrumentation and measurement science and technology research, development and applications. The list of program topics includes but is not limited to MEASUREMENT SCIENCE & EDUCATION, MEASUREMENT SYSTEMS, MEASUREMENT -DATA ACQUISITION, MEASUREMENTS OF PHYSICAL QUANTITIES, and MEASUREMENT APPLICATIONS.

  • 2010 IEEE Instrumentation & Measurement Technology Conference - I2MTC 2010

    The Conference focuses on all aspects of instrumentation and measurement science and technology research, development and applications. The list of program topics includes but is not limited to MEASUREMENT SCIENCE & EDUCATION, MEASUREMENT SYSTEMS, MEASUREMENT -DATA ACQUISITION, MEASUREMENTS OF PHYSICAL QUANTITIES, and MEASUREMENT APPLICATIONS.

  • 2009 IEEE Instrumentation & Measurement Technology Conference - I2MTC 2009

    The Conference focuses on all aspects of instrumentation and measurement science and technology research, development and applications. The list of program topics includes but is not limited to MEASUREMENT SCIENCE & EDUCATION, MEASUREMENT SYSTEMS, MEASUREMENT-DATA ACQUISITION, MEASUREMENTS OF PHYSICAL QUANTITIES, and MEASUREMENT APPLICATIONS.


2014 IEEE Semiconductor Wafer Test Workshop (SWTW 2014)

The IEEE SW Test Workshop is the only workshop specializing in semiconductor wafer level testing. It has a comprehensive technical program that is comnplemented by social activities which promote networking and sharing among the attendees. Booth displays at SWTW provide attendees with a one -stop opportunity to meet in person with all the key suppiers and learn about their new products and services.

  • 2013 IEEE Semiconductor Wafer Test Workshop (SWTW 2013)

    The IEEE SW Test Workshop is the only workshop specializing in semiconductor wafer level testing. It has a comprehensive technical program that is complemented by social activities which promote networking and sharing among the attendees. Booth displays at SWTW provide attendees with a on-stop opportunity to meet firsthand with all the key suppliers and learn about their new products and services.

  • 2012 IEEE Semiconductor Wafer Test Workshop (SWTW 2012)

    The IEEE SW Test Workshop is the only workshop specializing in semiconductor wafer level testing. It has a comprehensive technical program that is complemented by social activities which promote networking and sharing among the attendees. Booth displays at SWTW provide attendees with a on-stop opportunity to meet firsthand with all the key suppliers and learn about their new products and services.

  • 2011 IEEE Semiconductor Wafer Test Workshop (SWTW 2011)

    The IEEE SW Test Workshop is the only workshop specializing in semiconductor wafer level testing. It has a comprehensive technical program that is complemented by social activities which promote networking and sharing amoung attendees. Exhibit booth displays at SWTW provide attendees with a one-stop opportunity to meet firsthand with all key suppliers and learn about their new products and services.

  • 2010 IEEE Semiconductor Wafer Test Workshop (SWTW 2010)

    The IEEE SW Test Workshop is the only workshop specializing in semiconductor wafer level testing. It has a comprehensive technical program that is complemented by social activities which promote networking and sharing among the attendees. Booth displays at SWTW provide attendees with a one-stop opportunity to meet firsthand with all the key suppliers and learn about their new products and services.

  • 2009 IEEE Semiconductor Wafer Test Workshop (SWTW 2009)

    The IEEE SW Test Workshop is the only workshop specializing in semiconductor wafer level testing. It has a comprehensive technical program that is complemented by social activities which promote networking and sharing among the attendees. Booth displays at SWTW provide attendees with a one-stop opportunity to meet fi rsthand with all the key suppliers and learn about their new products and services.

  • 2008 IEEE Semiconductor Wafer Test Workshop (SWTW 2008)

    The SW Test Workshop is the only IEEE sponsored conference dealing with all aspects of semiconductor wafer and die level probe testing.


2013 81st ARFTG Microwave Measurement Conference (ARFTG)

RF and Microwave Measurement Techniques


2013 Conference on Lasers and Electro-Optics (CLEO)

CLEO serves as the premier international forum for scientific and technical optics, uniting the fields of lasers and opto-electronics by bringing together all aspects of laser technology, from basic research to industry applications.

  • 2012 Conference on Lasers and Electro-Optics (CLEO)

    CLEO 2012 features a complete and up-to-date technical program under three core conferences; CLEO: QELS- Fundamental Science, CLEO: Science & Innovations, and CLEO: Applications & Technology. CLEO: Expo and Market Focus bring CLEO 2012 full circle by highlighting the latest innovations and products as well as providing a forum to discuss marketplace trends and challenges.

  • 2011 Conference on Lasers and Electro-Optics (CLEO)

    CLEO, the Conference on Lasers and Electro-Optics, formerly known as CLEO/QELS, serves as the premier international forum for scientific and technical optics. The CLEO: 2011 Conference unites the fields of lasers and opto-electronics by bringing together all aspects of laser technology, from basic research to industry applications.

  • 2010 Conference on Lasers and Electro-Optics (CLEO)

    CLEO is held in conjunction with the Quantum Electronics and Laser Science Conference. CLEO/QELS attracts leaders in the fields of lasers, optical devices, optical fibers, photonics and innovative approaches in such fields as: laser spectroscopy, ultrafast optics, nonlinear optics, optical detectors, optical modulators, optical pulses, and quantum mechanics.

  • 2009 Conference on Lasers and Electro-Optics (CLEO)

    CLEO has evolved into a dynamic six-day event that has successfully bridged the science and applications sides of the optics and photonics industry. CLEO offers high-quality programming; the latest in the lasers, electro-optics and photonics industry; the CLEO Exhibit, which has over 350 participating companies; and a new location in Baltimore, Maryland. CLEO and PhAST 2008 is the must attend event of the year.

  • 2008 Conference on Lasers and Electro-Optics (CLEO)

    CLEO/QELS and PhAST has evolved into a dynamic six-day event that has successfully bridged the science and applications sides of the optics and photonics industry. CLEO/QELS offers high-quality programming; the latest in the lasers, electro-optics and photonics industry; the CLEO Exhibit, which has over 350 participating companies; and a new location in San Jose, California. CLEO/QELS and PhAST 2008 is the must attend event of the year.

  • 2007 Conference on Lasers & Electro-Optics/Quantum Electronics and Laser Science Conference (CLEO/QELS 2007)

  • 2006 Conference on Lasers & Electro-Optics/Quantum Electronics and Laser Science Conference (CLEO/QELS 2006)


2013 IEEE 11th International Conference on Electronic Measurement & Instruments (ICEMI)

ICEMI is invited authors to submit original papers in any but not limited as following areas: Science Foundation of Instrument and Measurement Innovative Designing of Instrument and Test System Applications on Instrument and Testing Signal & Image Processing Sensor and Non-electric Measurement Communication and Network Test Systems Control Theory and Application Condition Monitoring, Fault Diagnosis and Prediction Other Relevant Theories and Technologies

  • 2011 IEEE 10th International Conference on Electronic Measurement & Instruments (ICEMI)

    ICEMI is the world s premier conference dedicated to the electronic test of devices, boards and systems covering the complete cycle from design verification, test, diagnosis, failure analysis and back to process and design improvement, and is convened every two years. The purpose of the ICEMI is to provide excellent opportunities for scientists, engineers, and participants throughout the world to present the latest research results and to exchange their views or experience.

  • 2009 9th International Conference on Electronic Measurement & Instruments (ICEMI 2009)

    Science Foundation of Instrument and Measurement Instrument, Measurement and Test Technology: Sensing Technology and Transducer Designing of Instrument and Test System Applications on Instrument and Testing: Communication and Network Test Systems Control Theory and Application

  • 2007 8th International Conference on Electronic Measurement & Instruments (ICEMI 2007)


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Periodicals related to Metrology

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Advanced Packaging, IEEE Transactions on

The IEEE Transactions on Advanced Packaging has its focus on the modeling, design, and analysis of advanced electronic, photonic, sensors, and MEMS packaging.


Components and Packaging Technologies, IEEE Transactions on

Component parts, hybrid microelectronics, materials, packaging techniques, and manufacturing technology.


Electronics Packaging Manufacturing, IEEE Transactions on

Design for manufacturability, cost and process modeling, process control and automation, factory analysis and improvement, information systems, statistical methods, environmentally-friendly processing, and computer-integrated manufacturing for the production of electronic assemblies, products, and systems.


Instrumentation and Measurement, IEEE Transactions on

Measurements and instrumentation utilizing electrical and electronic techniques.


Semiconductor Manufacturing, IEEE Transactions on

Addresses innovations of interest to the integrated circuit manufacturing researcher and professional. Includes advanced process control, equipment modeling and control, yield analysis and optimization, defect control, and manufacturability improvement. It also addresses factory modelling and simulation, production planning and scheduling, as well as environmental issues in semiconductor manufacturing.




Xplore Articles related to Metrology

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Multiple Access Interference Suppression for TWSTFT Applications

Yi-Jiun Huang; Hen-Wai Tsao; Huang-Tien Lin; Chia-Shu Liao IEEE Transactions on Instrumentation and Measurement, 2017

Multiple access interference (MAI) is one of the unstable sources of the two- way satellite time and frequency transfer (TWSTFT), and causes an estimation error of the signal arrival time. To suppress MAI, the successive interference cancellation (SIC) procedure is implemented on the software-defined receiver. It generates MAIs and subtracts them from the received signal to become an interference-free signal. ...


Stereo-Lighting Reconstruction of Optical Scanning Holography

Jung-Ping Liu; Sheng-Yen Wang IEEE Transactions on Industrial Informatics, 2016

A novel technique of simultaneously recording of multiple digital holograms with different lightings is proposed. The technique is based on optical scanning holography (OSH). In OSH, the object is raster scanned by a heterodyne interference pattern, and a single-pixel detector is applied to detect the scattered light. Subsequently, a complex hologram is obtained by removing the carrier and conjugate term. ...


Characterization of power amplifier inter-modulation nonlinearity using multisine-based nonlinear vector network analyzer

Yichi Zhang; Zhao He; Jianming Huang; Nie Meining 2015 Asia-Pacific Microwave Conference (APMC), 2015

This paper uses multisines and a vector network analyzer (VNA) to achieve a dense-spectral-grid Nonlinear-VNA (NVNA) testbed, so that the inter-modulation nonlinearity of a RF power amplifier can be well characterized in the frequency domain. The multisine signals are provided by vector signal generators, and are used as both the NVNA phase reference and the modulated test stimulus. Based on ...


Intensity-based pointwise processing in dynamic laser speckle analysis

Elena Stoykova; Natalia Berberova; Dimana Nazarova; Atanas Gotchev 2015 11th Conference on Lasers and Electro-Optics Pacific Rim (CLEO-PR), 2015

Intensity-based pointwise algorithms for 2D evaluation of activity in optical metrology with dynamic speckle analysis are studied. They are applied to a temporal sequence of correlated speckle patterns formed at laser illumination of the object surface. A new algorithm is proposed that provides the same quality of the 2D activity map but at less computational effort.


Improved algorithm of interaural time difference based on correlation method

Xiaomei Chen; Chenming Hu; Bo Zhong; Huan Xu; Xiujuan Feng 2016 IEEE International Conference on Mechatronics and Automation, 2016

Interaural Time Difference is important for sound location of ear. In this paper, an improved algorithm of the Interaural Time Difference calculation based on correlation is put forward. According to the binaural sound signal measurements, Binaural Phase Difference could be obtained by correlation calculation. Then with the aid of the trigonometric cosine theorem, the cycles difference between two signal are ...


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Educational Resources on Metrology

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eLearning

Multiple Access Interference Suppression for TWSTFT Applications

Yi-Jiun Huang; Hen-Wai Tsao; Huang-Tien Lin; Chia-Shu Liao IEEE Transactions on Instrumentation and Measurement, 2017

Multiple access interference (MAI) is one of the unstable sources of the two- way satellite time and frequency transfer (TWSTFT), and causes an estimation error of the signal arrival time. To suppress MAI, the successive interference cancellation (SIC) procedure is implemented on the software-defined receiver. It generates MAIs and subtracts them from the received signal to become an interference-free signal. ...


Stereo-Lighting Reconstruction of Optical Scanning Holography

Jung-Ping Liu; Sheng-Yen Wang IEEE Transactions on Industrial Informatics, 2016

A novel technique of simultaneously recording of multiple digital holograms with different lightings is proposed. The technique is based on optical scanning holography (OSH). In OSH, the object is raster scanned by a heterodyne interference pattern, and a single-pixel detector is applied to detect the scattered light. Subsequently, a complex hologram is obtained by removing the carrier and conjugate term. ...


Characterization of power amplifier inter-modulation nonlinearity using multisine-based nonlinear vector network analyzer

Yichi Zhang; Zhao He; Jianming Huang; Nie Meining 2015 Asia-Pacific Microwave Conference (APMC), 2015

This paper uses multisines and a vector network analyzer (VNA) to achieve a dense-spectral-grid Nonlinear-VNA (NVNA) testbed, so that the inter-modulation nonlinearity of a RF power amplifier can be well characterized in the frequency domain. The multisine signals are provided by vector signal generators, and are used as both the NVNA phase reference and the modulated test stimulus. Based on ...


Intensity-based pointwise processing in dynamic laser speckle analysis

Elena Stoykova; Natalia Berberova; Dimana Nazarova; Atanas Gotchev 2015 11th Conference on Lasers and Electro-Optics Pacific Rim (CLEO-PR), 2015

Intensity-based pointwise algorithms for 2D evaluation of activity in optical metrology with dynamic speckle analysis are studied. They are applied to a temporal sequence of correlated speckle patterns formed at laser illumination of the object surface. A new algorithm is proposed that provides the same quality of the 2D activity map but at less computational effort.


Improved algorithm of interaural time difference based on correlation method

Xiaomei Chen; Chenming Hu; Bo Zhong; Huan Xu; Xiujuan Feng 2016 IEEE International Conference on Mechatronics and Automation, 2016

Interaural Time Difference is important for sound location of ear. In this paper, an improved algorithm of the Interaural Time Difference calculation based on correlation is put forward. According to the binaural sound signal measurements, Binaural Phase Difference could be obtained by correlation calculation. Then with the aid of the trigonometric cosine theorem, the cycles difference between two signal are ...


More eLearning Resources

IEEE-USA E-Books

  • About the Author

    "Joseph F. Keithley, a modern pioneer of instrumentation, brings you a fascinating history of electrical measurement from the ancient Greeks to the inventors of the early twentieth century. Written in a direct and fluent style, the book illuminates the lives of the most significant inventors in the field, including George Simon Ohm, Andre Marie Ampere, and Jean Baptiste Fourier. Chapter by chapter, meet the inventors in their youth and discover the origins of their lifelong pursuits of electrical measurement. Not only will you find highlights of important technological contributions, you will also learn about the tribulations and excitement that accompany the discoveries of these early masters. Included are nearly 100 rare photographs from museums around the world. THE STORY OF ELECTRICAL AND MAGNETIC MEASUREMENTS is a ""must read"" for students and practitioners of physics, electrical engineering, and instrumentation and metrology who want to understand the history behind modern day instruments." Sponsored by: IEEE Instrumentation and Measurement Society

  • Commission B: Fields and Waves

    "The purpose of this book is to further communication and understanding of the status and future of radio science, both for those working in the field, and for those who want to know what is of current importance in this area. The International Union of Radio Science, URSI (Union Radio-Scientifique Internationale), has divided the subject of ""Radio Science"" according to the ten topics of the Commissions that make up URSI: * Electromagnetic metrology * Fields and waves * Signals and systems * Electronics and photonics * Radio astronomy * Electromagnetic noise and interference * Wave propagation and remote sensing * Ionospheric radio and propagation * Waves in plasmas * Electromagnetics in biology and medicine This book consists of 37 original, peer-reviewed papers. The topics, authors, and reviewers were selected by the URSI Commissions. Each paper provides a critical, in-depth review of and, in many cases, tutorial on advances and research that have been of significant importance within the area of interest of the Commissions during the past three to four years. Among the 37 topics covered are the following: * Two-way satellite time and frequency transfer * Handset antennas for mobile communications * Wireless ATM networks * Ultra-high-bit-rate optical communication systems * Modeling techniques for EMC analysis * Mobile, terrestrial, and satellite propagation modeling * GPS and the ionosphere * Radio-frequency sounders in space * The early radio universe * Exposure assessment for handheld mobile communications devices A ""Collected References"" CD-ROM is an integral part of this book, intended to permit a reader to install the bibliographic database on a personal computer or workstation, so that it can be searched as needed. Independently of the papers in the boo k, the CD-ROM contains key references on the topics each Commission has deemed to be most significant during the triennium. The full titles are included in the references, and they are augmented by keywords including the country of origin for the work, to facilitate searching for the most important references on a particular topic."

  • Appendix C: References

    No abstract.

  • Convertibility across Measurement Methods

    This chapter contains sections titled: Introduction Overview of Previous Convertibility Studies A Convertibility Study of an Industry Dataset FP to Cosmic Convertibility: Issues and Discussion

  • The Design of Software Measurement Methods

    This chapter contains sections titled: Introduction Linking Software Measurement and Metrology Defining the Measurement Principle Determining the Measurement Method Products of the Measurement Design Phase Post Design Activity: Determining a Measurement Procedure Summary Advanced Readings 1: Verification Criteria for Software Measurement Methods Advanced Readings 2: Relational Structures in Assigning a Numerical Value

  • Index

    No abstract.

  • Design of Standard Etalons: The next Frontier in Software Measurement

    This chapter contains sections titled: Introduction - Measurement Standard Etalon Calibration and Testing: Reference Material and Uncertainty Related Work in Software Measurement A (Draft) Methodology to Design an FSM Standard Etalon Discussion Advanced Readings: The Development of an (Initial) Draft of a Measurement Standard Etalon for Cosmic

  • From Measurement Methods to Quantitative Models: A Measurement Context Model

    This chapter contains sections titled: Introduction: Numbers, Measures, and Quantitative Models Measurement Context Model How to Design a Measurement Method Application of a Measurement Method Exploitation of Measurement Results in Quantitative Models Validation or Verification? Advanced Readings : Analysis of the ISO Requirements for the Designs of Functional Size Measurement Methods

  • Part Introduction

    No abstract.

  • Part Introduction

    No abstract.



Standards related to Metrology

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IEEE Guide for Measurement of Environmental Sensitivities of Standard Frequency Generators

This project is a revision of the existing guide for measurements of environmental sensitivities of standard frequency generators. It includes effects and metrology of acceleration; temperature, humidity, and pressure; electrical and magnetic fields; ionizing and particle radiation; and aging, warm-up time and retrace.


IEEE Standard Definitions of Physical Quantities for Fundamental Frequency and Time Metrology--Random Instabilities



Jobs related to Metrology

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